The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
May. 18, 2011
Takahiro Hayama, Tokyo, JP;
Kazunori Kusabiraki, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
Ken Maruyama, Tokyo, JP;
Kiyoshi Tanaka, Tokyo, JP;
Takahiro Hayama, Tokyo, JP;
Kazunori Kusabiraki, Tokyo, JP;
Yukio Nishimura, Tokyo, JP;
Ken Maruyama, Tokyo, JP;
Kiyoshi Tanaka, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. Rin the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). Rin the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. Rrepresents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.