The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Jun. 30, 2022
Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Takuhiro Taniguchi, Tokyo, JP;

Katsuaki Nishikori, Tokyo, JP;

Hayato Namai, Tokyo, JP;

Kazuya Kiriyama, Tokyo, JP;

Ken Maruyama, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 303/32 (2006.01); C07C 381/12 (2006.01); C08G 75/20 (2016.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 303/32 (2013.01); C07C 381/12 (2013.01); C08G 75/20 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01);
Abstract

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R, R, and Reach independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X, X, and Xeach independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; Rrepresents a hydrocarbon group having 1 to 20 carbon atoms and Rrepresents a hydrocarbon group having 1 to 20 carbon atoms, or Rand Rtaken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which Rand Rbond; n is 0 or 1; Arepresents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R)CO—.


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