The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12422748 B1

Date of Patent:

Sep. 23, 2025

Filed:

Jun. 29, 2023

Radiation-sensitive resin composition and method for forming resist pattern

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Ken Maruyama, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

John S Chu

Int. Cl.

CPC ...

G03F 7/004 (2006.01); C07C 303/32 (2006.01); C07C 309/06 (2006.01); C07C 309/12 (2006.01); C07C 309/19 (2006.01); C07C 309/24 (2006.01); C07C 381/12 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01);

U.S. Cl.

CPC ...

G03F 7/0045 (2013.01); C07C 303/32 (2013.01); C07C 309/06 (2013.01); C07C 309/12 (2013.01); C07C 309/19 (2013.01); C07C 309/24 (2013.01); C07C 381/12 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01);

Abstract

A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R-Rare each independently a group having a cyclic structure; X-Xare each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of Xor X, at least one of Xor X, and at least one of Xor Xare not a hydrogen atom, respectively. A-Aare each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

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