Jsr Corporation

Ken Maruyama

Toshiyuki Kai

Daisuke Shimizu

Katsuaki Nishikori

Takuhiro Taniguchi

Kazuya Kiriyama

Motohiro Shiratani

Tsutomu Shimokawa

Kazuki Kasahara

Kota Nishino

Toru Kimura

Tomoki Nagai

Yukio Nishimura

Takuo Sone

Takehiko Naruoka

Hirokazu Sakakibara

Hisashi Nakagawa

Hayato Namai

Kiyoshi Tanaka

Takanori Kawakami

Kazuo Nakahara

Yusuke Anno

Takahiro Hayama

Sosuke Osawa

Miki Tamada

Yasuhiko Matsuda

Kazunori Kusabiraki

Ryuichi Nemoto

Kanako Meya

Yoshiki Nonoyama

Ryo Kumegawa

Shuto Mori

Koji Inukai

A radiation-sensitive resin composition includes: a base resin comprising a structure unit having an acid-dissociable group; and a radiation-sensitive acid generator which comprises compounds represented by formula (2) and formula (3), and optionally a compound represented by formula (1). R-Rare each independently a group having a cyclic structure; X-Xare each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group. At least one of Xor X, at least one of Xor X, and at least one of Xor Xare not a hydrogen atom, respectively. A-Aare each independently a hydrogen atom, or a hydrocarbon group having a carbon number of 1 to 20. The radiation-sensitive resin composition does not comprise a ketone-based solvent. The the radiation-sensitive resin composition does not comprise a monovalent onium cation other than an onium cation represented by formulas (X-1), (X-3), (X-4), or (X-5).

Radiation-sensitive resin composition and method for forming resist pattern

A radiation-sensitive resin composition includes a resin having a partial structure represented by formula (1). Rand Reach independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or Rand Rare bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which Rand Rare bonded; Rrepresents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and containing a fluorine atom. No fluorine atom is bonded to carbon atoms located at α-, β- and γ-positions of the carbon atom to which Rand Rare bonded; and No fluorine atom is bonded to carbon atoms located at α- and β-positions of the carbon atom to which Ris bonded.

Radiation-sensitive resin composition, method for forming resist pattern and compound

A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R, R, and Reach independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X, X, and Xeach independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; Rrepresents a hydrocarbon group having 1 to 20 carbon atoms and Rrepresents a hydrocarbon group having 1 to 20 carbon atoms, or Rand Rtaken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which Rand Rbond; n is 0 or 1; Arepresents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R)CO—.

Radiation-sensitive resin composition, method of forming resist pattern, and compound

A method for producing a film includes: coating a surface of a substrate with a composition containing a polymer having a structural unit represented by formula (1) and having a number average molecular weight of 13000 or more and a solvent, heating a coating film formed by the coating, and removing, with a rinsing liquid, a part of the coating film after the heating, wherein the rinsing liquid to be used contains a basic compound. In the formula (1), Yis a single bond, &#x2014;CO&#x2014;NR&#x2014;, a divalent aromatic ring group, a divalent group containing &#x2014;O&#x2014;, or a divalent group containing &#x2014;CO&#x2014;NR&#x2014;. Ais a single bond, &#x2014;O&#x2014;, &#x2014;S&#x2014;, or &#x2014;NR&#x2014;. Ris a hydrogen atom, a monovalent hydrocarbon group, a monovalent halogenated hydrocarbon group, or a monovalent group having a heterocyclic structure.

Method for producing film

A radiation-sensitive resin composition includes: a resin including a structure unit having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. The radiation-sensitive acid generator includes at least two of compounds represented by formulae (1) to (3), provided that the compound represented by formula (1) and the compound represented by formula (3) within the scope of the compound represented by formula (2) are excluded. In the formulae (1) to (3), R, Rand Rare each independently a group having a cyclic structure; X, X, X, X, Xand Xare each independently a hydrogen atom, a fluorine atom, or a fluorinated hydrocarbon group, provided that both Xand X, both Xand X, and both Xand Xare not a hydrogen atom, respectively.

A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R, R, and Rrepresents a fluorine atom or the like; and Rand Reach independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, Rrepresents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of Rs represents a fluorine atom or the like; and Rrepresents a single bond or a divalent organic group having 1 to 20 carbon atoms. 

Radiation-sensitive resin composition and resist pattern-forming method

A radiation-sensitive resin composition contains: a polymer that includes a structural unit including an acid-labile group; and a radiation-sensitive acid generating agent. The radiation-sensitive acid generating agent includes a sulfonate anion and a radiation-sensitive cation. The sulfonate anion includes two or more rings, and an iodine atom and a monovalent group having 0 to 10 carbon atoms which includes at least one of an oxygen atom and a nitrogen atom bond to at least one of the two or more rings. The ring is preferably an aromatic ring. The radiation-sensitive acid generating agent is preferably a compound represented by formula (1). In the formula (1), Arepresents a group obtained from a compound which includes a ring having 3 to 20 ring atoms by removing (p+q+r+1) hydrogen atoms on the ring. 

Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid

A radiation-sensitive resin composition contains: a polymer having a first structural unit represented by formula (1), and a second structural unit represented by formula (2) and having an acid-labile group. A first acid, to be generated from the first acid generating agent, disassociates the acid labile group in the polymer upon heating under a condition involving a temperature of no less than 80&#xb0; C. and no greater than 140&#xb0; C. for a time period of 1 minute, and the second acid, to be generated from the second acid generating agent, does not substantially disassociate the acid-labile group under the condition. The polymer is synthesized by RAFT, ATRP, or NMP, and a RAFT agent is at least one selected from the group consisting of a mercaptocarboxylic acid ester, a disulfide, a dithioester, a xanthate, a dithiocarbamate, and a trithiocarbonate. 

Radiation-sensitive resin composition, production method thereof, and resist pattern-forming method

A radiation-sensitive composition includes: a first polymer having a first structural unit that includes an acid-labile group; and a first compound including a metal cation and a first anion that is a conjugate base of an acid. The acid has a pKa of no greater than 0. The acid is preferably sulfonic acid, nitric acid, organic azinic acid, disulfonylimidic acid or a combination thereof. The first compound is preferably represented by formula (1). In the formula (1), M represents a metal cation; A represents the first anion; x is an integer of 1 to 6; Rrepresents a &#x3c3; ligand; and y is an integer of 0 to 5, and a sum: x+y is no greater than 6. The van der Waals volume of the acid is preferably no less than 2.5&#xd7;10m.[AMR]&#x2003;&#x2003;(1)

Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent

A pattern-forming method comprises forming a prepattern that is insoluble or hardly soluble in an organic solvent. A first composition is applied on at least lateral faces of the prepattern to form a resin layer. Adjacent regions to the prepattern of the resin layer are insolubilized or desolubilized in the organic solvent without being accompanied by an increase in a molecular weight by heating the prepattern and the resin layer. Regions other than the adjacent regions insolubilized or desolubilized of the resin layer are removed with the organic solvent. The first composition comprises a first polymer having a solubility in the organic solvent to be decreased by an action of an acid. At least one selected from the following features (i) and (ii) is satisfied: (i) the first polymer comprises a basic group; and (ii) the first composition further comprises a basic compound.

Pattern-forming method and composition for resist pattern-refinement

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. Rand Reach independently represent a hydrogen atom, or the like. Rand Reach independently represent a hydrogen atom or the like. Xand Xeach independently represent a hydrogen atom, or the like, or Xand Xtaken together represent &#x2014;S&#x2014;, &#x2014;O&#x2014;, &#x2014;SO&#x2014;, or the like. A represents an ethanediyl group, wherein at least one hydrogen atom included in X, Xand A is substituted by &#x2014;Y&#x2014;SOM. Y represents an alkanediyl group having 1 to 10 carbon atoms, or the like. Mrepresents a monovalent onium cation. In the case where &#x2014;Y&#x2014;SOMis present in a plurality of number, a plurality of Ys are each identical or different and a plurality of Ms are each identical or different. 

Radiation-sensitive resin composition and compound

A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. Rin the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). Rin the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. Rrepresents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom. 

Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method

A radiation-sensitive composition includes a photoacid generator shown by a general formula (0-1a). Each of Rindividually represents a substituted or unsubstituted organic group which includes a carbon atom, a hydrogen atom, and an oxygen atom, and which includes at least one ester bond, and Mrepresents a monovalent onium cation. A compound is shown by a general formula (0). R represents a substituted or unsubstituted organic group which includes a carbon atom, a hydrogen atom, and an oxygen atom, and which includes at least one ester bond, and Mrepresents a monovalent onium cation. 

Radiation-sensitive composition and compound

A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each Rindependently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. Rrepresents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rrepresents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rrepresents a fluoromethylene group or a divalent fluoroalkylene group. Mrepresents a monovalent onium cation. Optionally Rbonds to Ror Rto form a cyclic structure. 

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), Ris a group represented by a formula (a1), and Mrepresents a radiation-degradable monovalent cation. In the formula (a1), Rrepresents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. Rrepresents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. Rrepresents &#x2014;CO&#x2014;, or the like. Rrepresents &#x2014;CO&#x2014;, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with &#x2014;O&#x2014; in the formula (1). 

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Tokyo, Japan

Ken Maruyama