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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12572075 B1

PDFFull Text
Date of Patent:
Mar. 10, 2026

Filed:

Sep. 12, 2022

Composition, method of forming resist underlayer film, and method of forming resist pattern

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Yugaku Takagi, Tokyo, JP;

Tsubasa Abe, Tokyo, JP;

Takashi Katagiri, Tokyo, JP;

Satoshi Dei, Tokyo, JP;

Kazunori Takanashi, Tokyo, JP;

Yuya Hayashi, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08F 216/02 (2006.01); C08F 220/22 (2006.01); C08G 8/12 (2006.01); C08G 8/24 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 216/02 (2013.01); C08F 220/22 (2013.01); C08G 8/12 (2013.01); C08G 8/24 (2013.01); H01L 21/0271 (2013.01);
Abstract

A composition includes: a compound including an aromatic ring; and a first polymer including a first structural unit represented by formula (1) and a second structural unit represented by formula (2). A content of the first polymer with respect to 100 parts by mass of the compound is no less than 0.1 parts by mass and no greater than 200 parts by mass. Rrepresents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group; and Rrepresents a substituted or unsubstituted monovalent hydrocarbon group. Rrepresents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group; L represents a single bond or a divalent linking group; Ar represents a group obtained by removing (n+1) hydrogen atoms from a substituted or unsubstituted aromatic ring; Rrepresents a hydroxy group or a monovalent hydroxyalkyl group; and n is an integer of 1 to 8.

Find Patent Forward Citations

Takagi, Yugaku. (2026). Composition, method of forming resist underlayer film, and method of forming resist pattern (U.S. Patent No. 12572075). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12572075

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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