Tokyo, Japan

Tsubasa Abe

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016-2022

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9 patents (USPTO):Explore Patents

Title: **Tsubasa Abe: Innovator in Resist Underlayer Film Technology**

Introduction

Tsubasa Abe is a distinguished inventor located in Tokyo, Japan. With an impressive portfolio of 9 patents, Abe has significantly contributed to the field of resist underlayer film technology, showcasing his expertise and innovative thinking in the industry.

Latest Patents

Abe's latest patents reflect his deep knowledge and understanding of resist underlayer film formation. His notable inventions include compositions and methods designed to enhance substrate production processes. A key patent titled "Composition for resist underlayer film formation, resist underlayer film and method for producing patterned substrate" outlines a composition that involves a first compound and a solvent. This formulation features a first group represented by a specific formula (1), which incorporates essential elements such as an aromatic ring. Furthermore, another patent presents a similar composition where the formula is defined to include groups represented by various sub-formulas, emphasizing the intricate nature of his inventions.

Career Highlights

Throughout his career, Tsubasa Abe has worked with prominent companies in the field, including JSR Corporation and Nippon Chemi-Con Corporation. His contributions in these companies have played a crucial role in advancing technologies related to resist underlayer films, earning him recognition among peers and industry experts alike.

Collaborations

Abe has had the opportunity to collaborate with skilled professionals, including coworkers Goji Wakamatsu and Naoya Nosaka. These collaborations have further enriched his work, allowing for the synthesis of ideas that lead to innovative solutions in the realm of resist underlayer films.

Conclusion

In conclusion, Tsubasa Abe stands out as a leading innovator in the development of resist underlayer film technology. With a solid foundation of patents and collaborations with esteemed colleagues, his contributions continue to impact the field, positioning him as a significant figure in the landscape of technology and innovation.

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