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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11126084 B1

PDFFull Text
Date of Patent:
Sep. 21, 2021

Filed:

Apr. 18, 2019

Composition for resist underlayer film formation, resist underlayer film and forming method thereof, production method of patterned substrate, and compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Naoya Nosaka, Tokyo, JP;

Goji Wakamatsu, Tokyo, JP;

Tsubasa Abe, Tokyo, JP;

Yuushi Matsumura, Tokyo, JP;

Yoshio Takimoto, Tokyo, JP;

Shin-ya Nakafuji, Tokyo, JP;

Kazunori Sakai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Caleen O Sullivan

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 61/02 (2006.01); C09D 165/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); C07C 35/37 (2006.01); C07C 33/28 (2006.01); C07C 35/44 (2006.01); C07C 43/166 (2006.01); H01L 21/027 (2006.01); H01L 21/308 (2006.01); C08F 299/02 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07C 33/28 (2013.01); C07C 35/37 (2013.01); C07C 35/44 (2013.01); C07C 43/166 (2013.01); C08F 299/02 (2013.01); C08G 61/02 (2013.01); C09D 165/00 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/26 (2013.01); H01L 21/027 (2013.01); H01L 21/0273 (2013.01); H01L 21/3081 (2013.01); C07C 2602/42 (2017.05); C07C 2603/20 (2017.05); C07C 2603/50 (2017.05); C07C 2603/54 (2017.05); C08G 2261/148 (2013.01); C08G 2261/1414 (2013.01); C08G 2261/1422 (2013.01); C08G 2261/1424 (2013.01); H01L 21/3065 (2013.01);
Abstract

A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. Rrepresents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; Lrepresents an ethynediyl group or a substituted or unsubstituted ethenediyl group; Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.

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