Company Filing History:
Years Active: 2015-2023
Title: Yuushi Matsumura: Innovator in Film-Forming Technologies
Introduction
Yuushi Matsumura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of film-forming technologies, holding a total of 9 patents. His work focuses on compositions and methods that enhance the production of patterned substrates.
Latest Patents
Matsumura's latest patents include innovative compositions for resist underlayer film formation. One notable patent describes a composition that contains a compound and a solvent, where the compound has a molecular weight of no less than 200 and a carbon atom content of at least 40% by mass. The compound is defined by a specific formula that includes various groups and structures, showcasing his expertise in chemical engineering and materials science.
Another significant patent involves a composition for resist underlayer film formation, which includes a compound represented by a specific formula and a solvent. This composition is designed to improve the efficiency and effectiveness of resist underlayer films, which are crucial in the semiconductor manufacturing process.
Career Highlights
Matsumura is currently employed at JSR Corporation, where he continues to develop innovative solutions in the field of materials science. His work has not only advanced the technology but has also contributed to the growth and reputation of his company in the industry.
Collaborations
Throughout his career, Matsumura has collaborated with talented individuals such as Naoya Nosaka and Tsubasa Abe. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Yuushi Matsumura is a distinguished inventor whose work in film-forming technologies has led to numerous patents and advancements in the field. His contributions continue to impact the industry positively, showcasing the importance of innovation in technology.