The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2022

Filed:

May. 11, 2020
Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Naoya Nosaka, Tokyo, JP;

Yuushi Matsumura, Tokyo, JP;

Hiroki Nakatsu, Tokyo, JP;

Kazunori Takanashi, Tokyo, JP;

Hiroki Nakagawa, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C09D 7/63 (2018.01); C07D 241/24 (2006.01); H01L 21/027 (2006.01); C07D 251/24 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07D 251/24 (2013.01); C09D 7/63 (2018.01); H01L 21/0274 (2013.01); G03F 7/162 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01);
Abstract

A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Arrepresents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Aris a group bonding to a carbon atom of the aromatic heteroring in Arand represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and Rrepresents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group.ArArR))  (1)


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