Tokyo, Japan

Yoshio Takimoto

USPTO Granted Patents = 14 

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2014-2025

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14 patents (USPTO):

Title: **Innovative Contributions of Yoshio Takimoto**

Introduction

Yoshio Takimoto is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of resist underlayer films and substrate production. With a remarkable portfolio of 13 patents, Takimoto has been at the forefront of advancements that enhance the technology of film formation and patterning.

Latest Patents

Takimoto's latest patents include the following innovative works:

1. **Composition for resist underlayer film formation** - This patent centers on a compound that features a specific group represented by a unique formula, combined with a solvent suitable for film formation.

2. **Resist underlayer film and forming method thereof** - This invention outlines the methods and compositions that enable the creation of effective resist underlayer films.

3. **Production method of patterned substrate** - This patent elaborates a systematic approach to creating substrates with precise patterns, which are crucial in various manufacturing processes.

His work emphasizes the complex interactions of organic groups and bonding sites, contributing to advancements in materials science.

Career Highlights

Throughout his career, Yoshio Takimoto has made significant strides in research and development while working for esteemed companies such as JSR Corporation and IHI Corporation. His roles in these organizations have allowed him to apply his innovative ideas while collaborating with leading minds in the industry.

Collaborations

Takimoto has collaborated with notable colleagues, including Kazunori Takanashi and Masayuki Motonari. These partnerships have led to fruitful discussions that foster innovation and progress in the field of film technologies.

Conclusion

Yoshio Takimoto stands out as a key figure in the development of new materials and methods for resist underlayer films and patterned substrates. His 13 patents underscore a commitment to innovation and reflect his contribution to the present and future of technology in this specialized area.

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