The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2022
Filed:
Sep. 09, 2019
Jsr Corporation, Tokyo, JP;
Naoya Nosaka, Tokyo, JP;
Goji Wakamatsu, Tokyo, JP;
Tsubasa Abe, Tokyo, JP;
Ichihiro Miura, Tokyo, JP;
Kengo Ehara, Tokyo, JP;
Hiroki Nakatsu, Tokyo, JP;
Hiroki Nakagawa, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): Rand Reach independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of Rand Rrepresents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or Rand Rtaken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which Rand Rbond.