The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2026

Filed:

Mar. 08, 2022
Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Naoya Nosaka, Tokyo, JP;

Tsubasa Abe, Tokyo, JP;

Masato Dobashi, Tokyo, JP;

Kazunori Takanashi, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C07C 13/567 (2006.01); C07C 13/62 (2006.01); C07C 13/66 (2006.01); C07C 69/616 (2006.01); C07D 209/08 (2006.01); C07D 317/50 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C07C 13/567 (2013.01); C07C 13/62 (2013.01); C07C 13/66 (2013.01); C07C 69/616 (2013.01); C07D 209/08 (2013.01); C07D 317/50 (2013.01); C07C 2603/18 (2017.05); C07C 2603/50 (2017.05); C07C 2603/54 (2017.05); H01L 21/0273 (2013.01);
Abstract

A composition includes: a compound including an aromatic hydrocarbon ring structure, and a partial structure represented by formula (1) which bonds to the aromatic hydrocarbon ring structure; and a solvent. The aromatic hydrocarbon ring structure has no fewer than 25 carbon atoms. In the formula (1), X represents a group represented by formula (i), (ii), (iii), or (iv); and *'s denote binding sites to two adjacent carbon atoms constituting the aromatic hydrocarbon ring structure. A method of producing a patterned substrate, includes applying the composition directly or indirectly on a substrate to form a resist underlayer film; forming a resist pattern directly or indirectly on the resist underlayer film; and carrying out etching using the resist pattern as a mask.


Find Patent Forward Citations

Nosaka, Naoya. (2026). Composition, resist underlayer film, method of forming film, method of producing patterned substrate, and compound (U.S. Patent No. 12517433). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12517433

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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