Tokyo, Japan

Hiromitsu Nakashima

This inventor holds 30 USPTO granted patents and 5 published patent applications and 5 EPO patents, primarily in Radiation-Sensitive Polymers. Top assignees: Jsr Corporation, Jsp Corporation. Active years: 2011-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hiromitsu Nakashima. Retrieved from https://idiyas.com/inventor/hiromitsu-nakashima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 2011-2026

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Areas of Expertise:
Radiation-Sensitive Resin
Fluorine-Containing Polymer
Photoresist Composition
Pattern-Forming Method
Resist Film
Purification Method
Polymerizable Compound
Composition for Upper Layer Film
Lactone Copolymer
Positive-Tone Resin
Resist Pattern
Resist Underlayer Film
30 patents (USPTO):Explore Patents

Title: Hiromitsu Nakashima: Pioneering Innovations in Tokyo

Introduction: Hiromitsu Nakashima is a visionary inventor based in Tokyo, Japan, whose passion for innovation has led him to become a true pioneer in the world of inventions. With 29 patents to his name, Nakashima's relentless pursuit of technological advancement has inspired the next generation of inventors to dream big and create the impossible.

Latest Patents:

1. Fluorine-containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition: Nakashima's latest patent focuses on a novel fluorine-containing polymer for liquid immersion lithography, aiming to achieve excellent pattern shape and depth of focus. The resin composition includes a fluorine-containing polymer, a resin with an acid-unstable group, a radiation-sensitive acid generator, a nitrogen-containing compound, and a solvent.

2. Resin Composition and Method of Forming Resist Pattern: Another innovative patent by Nakashima involves a resin composition comprising a resin A, a resin C, and a solvent. The resin A contains a sulfonic-acid-group-containing structural unit and has a low fluorine atom content, while the resin C has a higher fluorine atom content.

Career Highlights: Nakashima has made significant contributions to the field of polymer chemistry and material science during his tenure at JSR Corporation and JSP Corporation. His expertise in developing novel materials for lithography applications has revolutionized the semiconductor industry and paved the way for advanced manufacturing processes.

Collaborations: Throughout his career, Nakashima has collaborated with esteemed colleagues such as Yukio Nishimura and Hiroki Nakagawa. Together, they have worked on cutting-edge projects that have pushed the boundaries of innovation in polymer synthesis and resist materials.

Conclusion: Hiromitsu Nakashima's dedication to pushing the boundaries of technological innovation and his commitment to creating groundbreaking inventions have established him as a pioneering figure in the world of patents and inventions. His work continues to inspire inventors worldwide to think creatively and pursue excellence in the field of materials science and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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