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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9268219 B1

PDFFull Text
Date of Patent:
Feb. 23, 2016

Filed:

Oct. 04, 2012

Photoresist composition and resist pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hiromu Miyata, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Masafumi Yoshida, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C08F 220/28 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C08F 220/28 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); C08F 2220/282 (2013.01); G03F 7/38 (2013.01);
Abstract

A photoresist composition includes a polymer that includes a first structural unit shown by a formula (1), and an acid generator. Rrepresents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. Rrepresents a divalent hydrocarbon group having 1 to 10 carbon atoms. A represents —COO—*, —OCO—*, —O—, —S—, or —NH—, wherein '*' indicates a site bonded to R. Rrepresents a single bond or a divalent hydrocarbon group having 1 to 10 carbon atoms. The polymer preferably further includes a second structural unit that includes an acid-labile group.

Find Patent Forward Citations

Miyata, Hiromu. (2016). Photoresist composition and resist pattern-forming method (U.S. Patent No. 9268219). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9268219

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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