logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12560866 B1

PDFFull Text
Date of Patent:
Feb. 24, 2026

Filed:

Jun. 01, 2022

Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Ryuichi Nemoto, Tokyo, JP;

Ryotaro Tanaka, Tokyo, JP;

Taiichi Furukawa, Tokyo, JP;

Katsuaki Nishikori, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Mark F Huff

Assistant Examiner:

Christine undefined Curiac

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C07C 69/734 (2006.01); C07C 69/736 (2006.01); C07C 69/96 (2006.01); C07D 307/00 (2006.01); C08F 212/14 (2006.01); C08F 220/10 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); C08F 220/36 (2006.01); C08F 220/38 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 69/734 (2013.01); C07C 69/736 (2013.01); C07C 69/96 (2013.01); C07D 307/00 (2013.01); C08F 212/22 (2020.02); C08F 220/282 (2020.02); C08F 220/283 (2020.02); C08F 220/303 (2020.02); C08F 220/365 (2020.02); C08F 220/382 (2020.02); G03F 7/038 (2013.01); C07C 2601/08 (2017.05); C07C 2601/14 (2017.05); C07C 2603/74 (2017.05);
Abstract

A radiation-sensitive resin composition includes: a first polymer including a structural unit including an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), A represents an oxygen atom or a sulfur atom; a sum of m and n is 2 or 3, wherein m is 1 or 2, and n is 1 or 2; X represents a single bond or a divalent organic group having 1 to 20 carbon atoms; and Rrepresents a monovalent organic group including a fluorine atom.

Find Patent Forward Citations

Nemoto, Ryuichi. (2026). Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound (U.S. Patent No. 12560866). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12560866

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…