Tokyo, Japan

Taiichi Furukawa

USPTO Granted Patents = 20 

 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2012)
  • Tokyo, JP (2013 - 2023)

Company Filing History:


Years Active: 2012-2025

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20 patents (USPTO):

Title: The Innovative World of Taiichi Furukawa

Introduction: Taiichi Furukawa, a visionary inventor based in Tokyo, has made significant contributions to the field of technology with his innovative creations. With a total of 19 patents to his name, his latest advancements in negative resist pattern-forming methods showcase his commitment to enhancing current processes in the industry.

Latest Patents: Among his notable recent patents is a negative resist pattern-forming method that emphasizes the formation of a resist pattern with minimal development defects while maintaining excellent water repellency on the upper layer film. This method involves utilizing radiation-sensitive resin compositions and compositions for upper layer film formation, along with liquid immersion lithography techniques.

Career Highlights: Throughout his illustrious career, Taiichi Furukawa has been associated with renowned companies such as JSR Corporation and International Business Machines Corporation (IBM). His expertise and innovative mindset have been pivotal in driving technological advancements within these organizations.

Collaborations: Collaborating closely with skilled individuals in the field, Taiichi Furukawa has worked alongside talented coworkers Hirokazu Sakakibara and Koji Ito. Together, they have combined their knowledge and expertise to push the boundaries of innovation and streamline processes in the ever-evolving technological landscape.

Conclusion: Taiichi Furukawa's dedication to innovation and his ability to consistently push the boundaries of what is achievable have positioned him as a true visionary in the world of technology. His relentless pursuit of excellence serves as an inspiration to aspiring inventors and underscores the importance of creativity and ingenuity in shaping the future of technological advancements.

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