The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Apr. 19, 2013
Jsr Corporation, Tokyo, JP;
Hirokazu Sakakibara, Tokyo, JP;
Masafumi Hori, Tokyo, JP;
Taiichi Furukawa, Tokyo, JP;
Koji Ito, Tokyo, JP;
JSR CORPORATION, Tokyo, JP;
Abstract
A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). Arepresents —N—SO—R, —COO, —Oor —SO. —SOdoes not directly bond to a carbon atom having a fluorine atom. Rrepresents a linear or branched monovalent hydrocarbon group, or the like. Xrepresents an onium cation.—AX  (1)