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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9229323 B1

PDFFull Text
Date of Patent:
Jan. 05, 2016

Filed:

May. 19, 2014

Pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hirokazu Sakakibara, Tokyo, JP;

Hiromu Miyata, Tokyo, JP;

Taiichi Furukawa, Tokyo, JP;

Koji Ito, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/30 (2006.01); G03F 7/004 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 224/00 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08F 220/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); C08F 224/00 (2013.01); G03F 7/004 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); C08F 2220/283 (2013.01); C08F 2220/382 (2013.01);
Abstract

A pattern-forming method includes providing a resist film on a substrate using a photoresist composition. The resist film is exposed. The exposed resist film is developed using a developer having an organic solvent content of 80 mass % or more. The photoresist composition includes a first polymer, a second polymer, and an acid generator. The first polymer is a base polymer and includes a first structural unit that includes an acid-labile group. The second polymer includes a second structural unit that includes an acid-labile group, and has a fluorine atom content higher than a fluorine atom content of the first polymer. The second structural unit is represented by a formula (1) or a formula (2).

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