The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2017

Filed:

May. 17, 2012
Applicants:

Yuko Kiridoshi, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Yusuke Asano, Tokyo, JP;

Takanori Kawakami, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Inventors:

Yuko Kiridoshi, Tokyo, JP;

Takehiko Naruoka, Tokyo, JP;

Yukio Nishimura, Tokyo, JP;

Yusuke Asano, Tokyo, JP;

Takanori Kawakami, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C08F 220/24 (2006.01); C08F 228/00 (2006.01); C08F 220/22 (2006.01); C08L 33/14 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 228/00 (2013.01); C08L 33/14 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01);
Abstract

A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.


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