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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11603459 B1

PDFFull Text
Date of Patent:
Mar. 14, 2023

Filed:

Aug. 26, 2021

Resin composition and method of forming resist pattern

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Tomohiko Sakurai, Tokyo, JP;

Sosuke Osawa, Tokyo, JP;

Hiromitsu Nakashima, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Duane Smith

Assistant Examiner:

Nicholas E Brown

Int. Cl.
CPC ...
C08L 41/00 (2006.01); G03F 7/11 (2006.01); C08L 101/04 (2006.01); C08L 101/08 (2006.01); C08L 101/06 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01); G03F 7/039 (2006.01); H01L 21/027 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
C08L 41/00 (2013.01); C08L 101/04 (2013.01); C08L 101/06 (2013.01); C08L 101/08 (2013.01); G03F 7/039 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); G03F 7/38 (2013.01); H01L 21/027 (2013.01); G03F 7/0045 (2013.01);
Abstract

A resin composition includes a resin A, a resin C, and a solvent. The resin A includes a sulfonic-acid-group-containing structural unit in an amount exceeding 5 mol % with respect to total structural units included in the resin A. The resin A has a content of a fluorine atom of 30 mass % or less with respect to a total mass of the resin A. The resin C includes a fluorine atom in a larger content per unit mass than the content of a fluorine atom per unit mass in the resin A. A content of the resin A in the resin composition is lower than a content of the resin C in the resin composition in terms of mass.

Find Patent Forward Citations

Sakurai, Tomohiko. (2023). Resin composition and method of forming resist pattern (U.S. Patent No. 11603459). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11603459

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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