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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11674225 B1

PDFFull Text
Date of Patent:
Jun. 13, 2023

Filed:

Jan. 04, 2018

Substrate processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hitoshi Kato, Oshu, JP;

Yukio Ohizumi, Oshu, JP;

Manabu Honma, Oshu, JP;

Takeshi Kobayashi, Oshu, JP;

Assignee:

TOKYO ELECTRON LIMTED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Jeffrie R Lund

Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01); C23C 14/50 (2006.01); C23C 14/04 (2006.01); H01L 21/304 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 14/26 (2006.01); C23C 14/22 (2006.01); B05C 11/10 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45551 (2013.01); B05C 11/1031 (2013.01); C23C 14/042 (2013.01); C23C 14/228 (2013.01); C23C 14/26 (2013.01); C23C 14/505 (2013.01); C23C 16/402 (2013.01); C23C 16/4584 (2013.01); C23C 16/45546 (2013.01); C23C 16/52 (2013.01); H01L 21/304 (2013.01); H01L 21/67051 (2013.01); H01L 21/67126 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 21/68792 (2013.01);
Abstract

There is provided a substrate processing apparatus for performing film formation by supplying a processing gas to a substrate, including: a rotary table provided in a processing container; a mounting stand provided to mount the substrate and configured to be revolved by rotating the rotary table; a processing gas supply part configured to supply a processing gas to a region through which the mounting stand passes by the rotation of the rotary table; a rotation shaft rotatably provided in a portion rotating together with the rotary table and configured to support the mounting stand; a driven gear provided on the rotation shaft; a driving gear provided along an entire circumference of a revolution trajectory of the driven gear to face the revolution trajectory of the driven gear and configured to constitute a magnetic gear mechanism with the driven gear; and a rotating mechanism configured to rotate the driving gear.

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