Kensaku Narushima

Title: **Kensaku Narushima: Innovating Substrate Processing Technologies**

Introduction

Kensaku Narushima, a prominent inventor based in Nirasaki, Japan, has made significant contributions to the field of substrate processing. With a remarkable portfolio of 21 patents, Narushima's innovations are at the forefront of film forming technologies, particularly in the semiconductor industry.

Latest Patents

Among Narushima's latest patents is a revolutionary substrate processing method and film forming system. This method outlines a unique process that involves providing a substrate with a natural oxide film, performing pre-processing to remove this film, and then directly forming a tungsten film on the substrate. This is achieved by heating the stage where the substrate is mounted to a predetermined temperature while simultaneously supplying tungsten chloride gas and a reduction gas.

Another noteworthy invention by Narushima is a raw material supply apparatus paired with a film forming apparatus. This system features a raw material supply path for introducing a gas into a processing container, complemented by a valve and a pressure sensor to monitor the internal pressure. The raw material exhaust path enables efficient gas removal, and the opening degree adjustment mechanism allows for precise control based on feedback from the pressure sensor.

Career Highlights

Narushima currently serves as an innovator at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work in substrate processing has positioned him as a key figure in advancing technology that supports semiconductor fabrication, which is vital for modern electronic devices.

Collaborations

Throughout his career, Kensaku Narushima has collaborated with notable colleagues, including Takanobu Hotta and Satoshi Wakabayashi. These collaborations have enriched his work, fostering a creative environment that drives advancements in substrate processing technologies.

Conclusion

Kensaku Narushima's contributions to innovation in substrate processing are exemplary of the transformative power of inventive technologies. With his extensive patent portfolio and influential collaborations, Narushima continues to play a pivotal role in enhancing film forming systems and driving forward the capabilities of semiconductor manufacturing.