The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2024

Filed:

Feb. 06, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kensaku Narushima, Nirasaki, JP;

Nagayasu Hiramatsu, Hillsboro, OR (US);

Takanobu Hotta, Nirasaki, JP;

Atsushi Matsumoto, Nirasaki, JP;

Masato Araki, Nirasaki, JP;

Hideaki Yamasaki, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C09K 13/08 (2006.01); C23C 16/06 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); H01L 21/306 (2006.01); H01L 21/3213 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C09K 13/08 (2013.01); C23C 16/06 (2013.01); C23C 16/45525 (2013.01); C23C 16/46 (2013.01); H01L 21/30604 (2013.01); H01L 21/32133 (2013.01); H01L 21/324 (2013.01); H01L 21/67063 (2013.01);
Abstract

There is provided a method of processing a substrate, the method including: providing the substrate on which a natural oxide film is formed; performing a pre-processing on the substrate such that the natural oxide film formed on the substrate is removed; and directly forming a tungsten film on the substrate by heating a stage on which the substrate is mounted to a predetermined temperature and supplying a tungsten chloride gas and a reduction gas to the substrate which has been subjected to the pre-processing.


Find Patent Forward Citations

Loading…