Nagayasu Hiramatsu

Title: Nagayasu Hiramatsu: Innovator in Substrate Processing Technology

Introduction

Nagayasu Hiramatsu is a notable inventor based in Hillsboro, Oregon. He has made significant contributions to the field of substrate processing, particularly in the development of methods for film formation. His innovative approach has led to advancements in technology that are essential for various applications.

Latest Patents

Hiramatsu holds a patent for a substrate processing method and film forming system. This patent describes a method that includes providing a substrate with a natural oxide film, performing pre-processing to remove the oxide film, and directly forming a tungsten film on the substrate. The process involves heating the substrate to a predetermined temperature and supplying tungsten chloride gas along with a reduction gas. This innovative method enhances the efficiency and effectiveness of film formation.

Career Highlights

Hiramatsu is associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has allowed him to focus on cutting-edge technologies that drive advancements in substrate processing. His expertise and innovative mindset have positioned him as a key player in his field.

Collaborations

Hiramatsu has collaborated with notable colleagues, including Kensaku Narushima and Takanobu Hotta. These collaborations have fostered an environment of innovation and have contributed to the development of new technologies in substrate processing.

Conclusion

Nagayasu Hiramatsu's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patent and work at Tokyo Electron Limited highlight his role as a significant inventor in this field.