The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2019

Filed:

Sep. 29, 2016
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Hironori Yagi, Yamanashi, JP;

Kensaku Narushima, Yamanashi, JP;

Atsunari Matsuyama, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/285 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01L 21/02 (2006.01); C23C 16/14 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28506 (2013.01); C23C 16/14 (2013.01); C23C 16/4481 (2013.01); C23C 16/45544 (2013.01); C23C 16/52 (2013.01); H01L 21/0262 (2013.01); H01L 21/02271 (2013.01);
Abstract

In a raw material gas supply apparatus, a control unit obtains an offset value of (m−(m+m)), m, mand mbeing respective measurement values of first and second mass controllers, and a mass flow meter, by supplying a carrier gas and a dilution gas in a state where the carrier gas flows through a bypass channel. Further, the control unit obtains an actual measurement value of a flow rate of the raw material by subtracting the offset value from (m−(m+m)) obtained by supplying the carrier gas and dilution gas in a state where the carrier gas flows through the inside of a raw material container and calculating a difference between a target value of the flow rate of the raw material and the actual measurement value, and adjusts a set value of the first mass flow controller such that the flow rate of the raw material becomes.


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