The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Nov. 27, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Kensaku Narushima, Nirasaki, JP;
Atsushi Matsumoto, Nirasaki, JP;
Nagayasu Hiramatsu, Hillsboro, OR (US);
Takanobu Hotta, Nirasaki, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/34 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01L 21/768 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); C23C 16/34 (2013.01); C23C 16/4412 (2013.01); C23C 16/45534 (2013.01); C23C 16/45553 (2013.01); C23C 16/45561 (2013.01); H01L 21/28088 (2013.01); H01L 21/76843 (2013.01);
Abstract
There is provided a method of forming a tungsten nitride film on a substrate to be processed, including: forming a tungsten film by repeating a cycle of alternately supplying a tungsten chloride gas and a hydrogen-containing gas with a supply of a purge gas interposed between the supply of the tungsten chloride gas and the supply of the hydrogen-containing gas; and nitriding the tungsten film by supplying a nitrogen-containing gas.