The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 22, 2020

Filed:

Feb. 21, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Katsumasa Yamaguchi, Nirasaki, JP;

Kensaku Narushima, Nirasaki, JP;

Hironori Yagi, Nirasaki, JP;

Kouichi Sekido, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/14 (2006.01); C23C 16/455 (2006.01); H01L 21/285 (2006.01); H01L 21/3205 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/14 (2013.01); H01L 21/28562 (2013.01); H01L 21/28568 (2013.01); H01L 21/32051 (2013.01); H01L 21/28079 (2013.01); H01L 21/28088 (2013.01); H01L 21/28097 (2013.01); H01L 21/28518 (2013.01);
Abstract

There is provided a gas supply method for temporarily storing a raw material gas generated by vaporizing a raw material accommodated in a raw material container inside a buffer tank together with a carrier gas and subsequently supplying the raw material gas into a processing container. The gas supply method includes: controlling a flow rate of a gas exhausted from the buffer tank and a flow rate of the raw material gas and the carrier gas filled in the buffer tank, so that a second internal pressure of the buffer tank becomes equal to a first internal pressure of the buffer tank when a process is performed by supplying the raw material gas into the processing container, before supplying the raw material gas into the processing container.


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