The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2019
Filed:
Sep. 07, 2017
Tokyo Electron Limited, Tokyo, JP;
Kensaku Narushima, Nirasaki, JP;
Katsumasa Yamaguchi, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method of filling recesses in a substrate with tungsten includes preparing the substrate within a chamber of a film forming apparatus, performing a first cycle at least once, the first cycle comprising introducing a tungsten-containing precursor gas into the chamber, purging the chamber, introducing a hydrogen-containing gas into the chamber, and purging the chamber, and performing a second cycle at least once after the first cycle is performed at least once, the second cycle comprising introducing the tungsten-containing precursor gas into the chamber, purging the chamber, introducing the hydrogen-containing gas into the chamber, and purging the chamber. A pressure in the chamber when the second cycle is performed is set to a pressure lower than a pressure in the chamber when the first cycle is performed.