The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Feb. 22, 2018
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Katsumasa Yamaguchi, Nirasaki, JP;

Kensaku Narushima, Nirasaki, JP;

Hironori Yagi, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/52 (2006.01); C23C 16/06 (2006.01); C23C 16/14 (2006.01); C23C 16/458 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/06 (2013.01); C23C 16/14 (2013.01); C23C 16/4481 (2013.01); C23C 16/4586 (2013.01); C23C 16/45544 (2013.01); C23C 16/45561 (2013.01);
Abstract

There is provided a gas supply device for vaporizing a raw material inside a raw material container and supplying a raw material gas into a processing vessel together with a carrier gas, including: a mass flow controller connected to an upstream side of the raw material container and configured to control a flow rate of the carrier gas; a flow meter connected to a downstream side of the raw material container; and a control part configured to perform a control so as not to supply the raw material gas into the processing vessel until a detection value of the flow meter with respect to the carrier gas controlled to have a constant flow rate by the mass flow controller is stabilized after replacing the raw material container.


Find Patent Forward Citations

Loading…