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Jun Hirose

This inventor holds 43 USPTO granted patents and 10 published patent applications, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Fujikin Inc., Tokyo Electron Limi Ted. Active years: 2000-2026.

USPTO Granted Patents = 43 (Patent Applications = 10)

% Patents Active = 90.7

Average Co-Inventor Count = 3.9

ph-index = 11

Forward Citations = 439(Granted Patents)

Location History:

Yamanashi-ken, JP (2000 - 2004)
Tokyo, JP (2006)
Nakakoma-gun, JP (2001 - 2007)
Yamanashi, JP (2001 - 2011)
Nirasaki, JP (2002 - 2015)
Kurokawa, JP (2015)
Miyagi, JP (2018 - 2024)

Company Filing History:

34 out of 10,837

Tokyo Electron Limited

Tokyo Electron Limi Ted

Shin-Etsu Chemical Co., Ltd.

$V-Tex Corporation$

7. 7 out of 834,307

Other

patents

where one patent can have more than one assignee

Years Active: 2000-2026

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Areas of Expertise:

Plasma Processing

Substrate Processing

Gas Supply Device

Plasma Monitoring

Vacuum Processing

Fluid Control

Flow Rate Control

Etching Apparatus

Maintenance Method

Magnetic Field Generator

Multi-Chamber Processing

Cooling System

43 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12663350 - Particle monitoring system, particle monitoring method, and monitoring device (2026-06-23),

2. 12494383 - Gas supply device and semiconductor manufacturing apparatus (2025-12-09),

3. 12424424 - Plasma monitoring system, plasma monitoring method, and monitoring device (2025-09-23),

4. 12424423 - Substrate processing apparatus (2025-09-23),

5. 12347660 - Substrate processing apparatus, substrate processing system, and maintenance method (2025-07-01),

6. 12293937 - Plasma processing apparatus and mounting table thereof (2025-05-06),

7. 12068139 - Plasma processing apparatus (2024-08-20),

8. 12040202 - Processing system (2024-07-16),

9. 12040166 - Substrate processing apparatus, substrate processing system, and maintenance method (2024-07-16),

10. 11569073 - Assembly provided with coolant flow channel, method of controlling assembly provided with coolant flow channel, and substrate processing apparatus (2023-01-31),

11. 11532467 - Maintenance device (2022-12-20),

12. 11501995 - Plasma processing apparatus and mounting table thereof (2022-11-15),

13. 11443925 - Substrate support and plasma processing apparatus (2022-09-13),

14. 11309168 - Vacuum processing apparatus and maintenance apparatus (2022-04-19),

15. 11062881 - Plasma etching method and plasma processing device (2021-07-13),

Title: The Innovative Mind of Jun Hirose

Introduction: Jun Hirose, a pioneering inventor hailing from Miyagi, Japan, is a remarkable woman whose creative spirit has led to groundbreaking innovations in various fields.

Latest Patents: Jun Hirose's recent patents showcase her dedication to pushing the boundaries of technology and design, with a focus on sustainability and efficiency.

Career Highlights: With a career spanning over two decades, Jun Hirose has consistently demonstrated her ability to transform ideas into tangible inventions that have the potential to revolutionize industries.

Collaborations: Throughout her career, Jun Hirose has collaborated with leading research institutions, universities, and forward-thinking companies to bring her inventions to life and make a lasting impact on society.

Conclusion: Jun Hirose's passion for innovation, coupled with her relentless drive to create a better future through her inventions, solidifies her status as a trailblazing inventor in the world of technology.

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