The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Nov. 08, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Satoru Teruuchi, Kurokawa-gun, JP;

Jun Hirose, Kurokawa-gun, JP;

Kazuya Nagaseki, Kurokawa-gun, JP;

Shinji Himori, Kurokawa-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/0205 (2024.01); G01N 15/0227 (2024.01); G01N 15/1433 (2024.01); G01N 15/10 (2006.01);
U.S. Cl.
CPC ...
G01N 15/0227 (2013.01); G01N 15/0211 (2013.01); G01N 2015/1029 (2024.01); G01N 2223/073 (2013.01);
Abstract

A particle monitoring system includes a light emitting device for irradiating an inside of a plasma processing apparatus with light, and a monitoring device to be placed on a stage in the plasma processing apparatus. The monitoring device includes a base substrate, a plurality of imaging devices, and a control device. The base substrate has a plate shape. The plurality of imaging devices have optical axes facing upward on the base substrate, and are disposed apart from each other to capture images including scattered light from the particle irradiated with the light. The control device discriminates the particle in the images captured by the plurality of imaging devices.


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