The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2025
Filed:
Oct. 30, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Yusuke Suzuki, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Kazuhide Hasebe, Nirasaki, JP;
Atsushi Endo, Nirasaki, JP;
Satoshi Tanaka, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/42 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01); H01L 21/308 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/45597 (2013.01); H01L 21/3086 (2013.01); H01L 22/12 (2013.01);
Abstract
A film forming method is provided. In the film forming method, a mask is prepared based on a measurement result of a surface state of a substrate. The mask is transferred into a process chamber and the substrate is transferred into the process chamber. Then, a film is formed on a back surface of the substrate while the mask is disposed onto the back surface of the substrate.