Nirasaki, Japan

Yusuke Suzuki

USPTO Granted Patents = 9 

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Beaverton, OR (US) (2017 - 2019)
  • Yamanashi, JP (2022)
  • Nirasaki, JP (2023)

Company Filing History:


Years Active: 2017-2025

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9 patents (USPTO):

Title: Yusuke Suzuki: Innovator in Plasma Processing Technologies

Introduction

Yusuke Suzuki is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of nine patents. His innovative work focuses on methods and apparatuses that enhance substrate processing techniques.

Latest Patents

Among his latest patents is a recess filling method and substrate processing apparatus. This method involves a combined process that includes a film formation process for creating films in recesses with varying aspect ratios, along with an etching process to refine these films. The process is designed to be repeated multiple times to achieve optimal results. Another notable patent is for a plasma processing apparatus and method. This invention features a processing chamber equipped with first and second electrodes that generate plasma to process target objects. The apparatus includes an allocation setting unit that manages power distributions to enhance processing efficiency.

Career Highlights

Yusuke Suzuki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this organization has allowed him to push the boundaries of plasma processing technology, contributing to advancements in the field.

Collaborations

Throughout his career, Yusuke has collaborated with notable colleagues, including Munehito Kagaya and Tadashi Mitsunari. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Yusuke Suzuki's contributions to plasma processing technologies exemplify his dedication to innovation. His patents reflect a deep understanding of substrate processing, and his work continues to influence the industry.

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