The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 2023
Filed:
Oct. 17, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Munehito Kagaya, Nirasaki, JP;
Yusuke Suzuki, Nirasaki, JP;
Shinya Iwashita, Nirasaki, JP;
Tadashi Mitsunari, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01); C23C 16/458 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); C23C 16/345 (2013.01); C23C 16/405 (2013.01); C23C 16/4586 (2013.01); C23C 16/45538 (2013.01); C23C 16/45544 (2013.01); C23C 16/52 (2013.01); H01J 37/32568 (2013.01); H01J 37/32577 (2013.01); H01J 37/32724 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02186 (2013.01); H01L 21/02274 (2013.01); H01J 2237/3321 (2013.01);
Abstract
When a titanium-containing gas and an oxidizing gas, or a silicon-containing gas and a nitriding gas, are alternately supplied from a gas supplier and radio frequency power is supplied to each of a first electrode and a second electrode from a power supply, parallel to the supply of the oxidizing gas or the nitriding gas, so as to generate plasma and to perform a film formation, a magnitude of the radio frequency power to be supplied to each of the first electrode and the second electrode is controlled.