The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2022
Filed:
Nov. 02, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Hideomi Hane, Yamanashi, JP;
Takeshi Oyama, Yamanashi, JP;
Kentaro Oshimo, Yamanashi, JP;
Yusuke Suzuki, Yamanashi, JP;
Jun Ogawa, Yamanashi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/511 (2006.01); B08B 9/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4408 (2013.01); C23C 16/4405 (2013.01); C23C 16/45557 (2013.01); C23C 16/511 (2013.01); H01J 37/32862 (2013.01); B08B 9/00 (2013.01); H01J 37/32798 (2013.01); H01J 37/32816 (2013.01);
Abstract
A processing method according to one aspect of the present disclosure includes varying pressure of a processing chamber in a state in which a plasma of a purge gas is formed in the processing chamber, the varying including removing a film deposited in the processing chamber, with the formed plasma.