Hideomi Hane is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of heat treatment and film deposition technologies. With a total of 13 patents to his name, Hane continues to push the boundaries of innovation in his industry.

Latest Patents

One of Hane's latest patents is a heat treatment apparatus, control method, and storage medium. This apparatus includes a control device that manages the heat treatment of a processing target within a processing container. The control device features a heat treatment control unit, a cleaning control unit, a cumulative film thickness specification unit, and a temperature correction unit. These components work together to optimize the heat treatment process based on specific conditions.

Another notable patent is related to a cleaning method and film deposition apparatus. This method involves cleaning the inside of a processing chamber in a film deposition apparatus that includes a rotary table. The cleaning process is designed to enhance efficiency by adjusting the flow rates of carrier and cleaning gases while the rotary table rotates.

Career Highlights

Hane is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has significantly impacted the development of advanced technologies in heat treatment and film deposition.

Collaborations

Hane has collaborated with notable coworkers, including Noriaki Fukiage and Jun Ogawa. Their combined expertise has contributed to the success of various innovative projects.

Conclusion

Hideomi Hane's contributions to the field of technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence advancements in heat treatment and film deposition processes.

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