The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2023
Filed:
Sep. 15, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); C23C 16/02 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/0227 (2013.01); H01L 21/02046 (2013.01); H01L 21/02263 (2013.01); H01L 21/324 (2013.01); H01L 21/67248 (2013.01);
Abstract
A plasma purge method that is performed after dry cleaning in a process container and before applying a deposition process to a substrate includes: (a) activating and supplying a first process gas containing Clin the process container; and (b) activating and supplying a second process gas containing Hand Oin the process container.