Nirasaki, Japan

Kazuhide Hasebe



Average Co-Inventor Count = 3.4

ph-index = 22

Forward Citations = 2,847(Granted Patents)

Forward Citations (Not Self Cited) = 2,822(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Shirane-machi, JP (1998 - 2002)
  • Minato-Ku, JP (2009)
  • Tokyo-To, JP (2006 - 2010)
  • Tokyo, JP (2006 - 2010)
  • Minamialps, JP (2007 - 2013)
  • Narasaki, JP (2015)
  • Nirasaki, JP (2001 - 2020)
  • Yamanashi, JP (2010 - 2022)

Company Filing History:


Years Active: 1998-2025

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Areas of Expertise:
Film Forming Method
Semiconductor Production Apparatus
Film Deposition Apparatus
Mask Pattern Forming Method
Plasma Processing Apparatus
Silicon Nitride Film
Thin Film Formation
Amorphous Silicon Film
Vertical Substrate Processing
Trench-Filling Method
Micro Pattern Forming
Oxidation Method
92 patents (USPTO):Explore Patents

Title: The Innovative Mind of Kazuhide Hasebe

Introduction: Kazuhide Hasebe is a pioneering inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kazuhide Hasebe holds several patents in various technological domains, showcasing his continuous dedication to pushing the boundaries of innovation.

Career Highlights: Throughout his illustrious career, Kazuhide Hasebe has consistently demonstrated a remarkable ability to transform ideas into tangible inventions that have had a significant impact on the industry.

Collaborations: Kazuhide Hasebe has collaborated with leading research institutions, universities, and innovative companies, further solidifying his reputation as a visionary inventor with a passion for creating cutting-edge solutions.

Conclusion: Kazuhide Hasebe's relentless pursuit of innovation and his remarkable contributions to the field make him a true trailblazer in the world of inventors, inspiring future generations to think outside the box and pursue their inventive dreams.

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