The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Oct. 26, 2022
Tokyo Electron Limited, Tokyo, JP;
Shinya Iwashita, Yamanashi, JP;
Ayuta Suzuki, Yamanashi, JP;
Takahiro Shindo, Yamanashi, JP;
Kazuki Dempoh, Yamanashi, JP;
Tatsuo Matsudo, Yamanashi, JP;
Yasushi Morita, Yamanashi, JP;
Takamichi Kikuchi, Yamanashi, JP;
Tsuyoshi Moriya, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A film forming apparatus includes a vacuum-evacuable processing chamber, a lower electrode for mounting thereon a target substrate, an upper electrode disposed to face the lower electrode, a gas supply unit, a voltage application unit and a switching unit. The gas supply unit supplies a film forming source gas to be formed into plasma to a processing space between the upper and the lower electrode. The voltage application unit applies to the upper electrode a voltage outputted from at least one of a high frequency power supply and a DC power supply included therein. The switching unit selectively switches the voltage to be applied to the upper electrode among a high frequency voltage outputted from the high frequency power supply, a DC voltage outputted from the DC power supply, and a superimposed voltage in which the DC voltage is superimposed with the high frequency voltage.