Takamichi Kikuchi

This inventor holds 13 USPTO granted patents and 8 published patent applications and 1 EPO patent. Top assignees: Tokyo Electron Limited, Tokyo Electron Limi Ted. Active years: 2010-2026.

USPTO Granted Patents = 13 (Patent Applications = 8)

% Patents Active = 92.3

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 335(Granted Patents)

Location History:

Nirasaki, JP (2010 - 2022)
Yamanashi, JP (2017 - 2024)

Company Filing History:

12 out of 10,862

Tokyo Electron Limited

patents

1 out of 103

Tokyo Electron Limi Ted

patents

Years Active: 2010-2026

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12545994 - Film forming method and film forming apparatus (2026-02-10),

2. 12456605 - Plasma processing apparatus and plasma processing method (2025-10-28),

3. 12428727 - Cyclic film deposition using reductant gas (2025-09-30),

4. 12027344 - Film forming apparatus (2024-07-02),

5. 11450512 - Plasma processing method (2022-09-20),

6. 10872764 - Film forming method (2020-12-22),

7. 10738374 - Method of performing a surface treatment on a mounting table, the mounting table and a plasma processing apparatus (2020-08-11),

8. 10665431 - Processing method (2020-05-26),

9. 10546753 - Method of removing silicon oxide film (2020-01-28),

10. 10361366 - Resistive random accress memory containing a conformal titanium aluminum carbide film and method of making (2019-07-23),

11. 9984892 - Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system (2018-05-29),

12. 9659756 - Plasma etching apparatus and plasma cleaning method (2017-05-23),

13. 7736942 - Substrate processing apparatus, substrate processing method and storage medium (2010-06-15),

Title: Takamichi Kikuchi: Innovator in Plasma Processing Technology

Introduction

Takamichi Kikuchi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing, holding a total of 12 patents. His work focuses on advanced methods and apparatuses for processing substrates using plasma technology.

Latest Patents

Among his latest innovations is a plasma processing apparatus designed to perform plasma processing on a substrate. This apparatus features a processing chamber, a substrate support, a grounded lower electrode, and an upper electrode. It also includes a gas supply unit for processing gas and a radio frequency power supply to generate plasma. Additionally, Kikuchi has developed a method for cyclic film deposition using reductant gas. This method involves a cycle that includes precursor and reactant steps, with a reductant step performed to enhance film deposition on the substrate.

Career Highlights

Kikuchi has worked with notable companies in the semiconductor industry, including Tokyo Electron Limited. His expertise in plasma processing has positioned him as a key figure in the development of innovative technologies that enhance manufacturing processes.

Collaborations

Throughout his career, Kikuchi has collaborated with esteemed colleagues such as Toshio Hasegawa and Shinya Iwashita. These partnerships have contributed to the advancement of plasma processing technologies and have fostered a collaborative environment for innovation.

Conclusion

Takamichi Kikuchi's contributions to plasma processing technology have established him as a leading inventor in his field. His patents and collaborative efforts continue to influence advancements in substrate processing methods.