The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Aug. 13, 2008
Eiichi Nishimura, Nirasaki, JP;
Takamichi Kikuchi, Nirasaki, JP;
Eiichi Nishimura, Nirasaki, JP;
Takamichi Kikuchi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus is provided to enable to efficiently remove an oxide layer and an organic material layer. A third process unit () of a substrate processing apparatus () includes a box-shaped process vessel (chamber) (), a nitrogen gas supply system () and an ozone gas supply system (). The ozone gas supply system () includes an ozone gas supply unit () and an ozone gas supply pipe () connected to the ozone gas supply unit (). The ozone gas supply pipe () has an ozone gas supply hole () having an opening arranged opposite to a wafer (W). The ozone gas supply unit () supplies an ozone (O) gas into the chamber () through the ozone gas supply hole () via the ozone gas supply pipe ().