Location History:
- Tokyo, JP (2011)
- Nirasaki, JP (2008 - 2022)
- Yamanashi, JP (2004 - 2024)
Company Filing History:
56 out of 10,341 
1 out of 29,279 
1 out of 433 
Years Active: 2004-2025
Areas of Expertise:
Title: Innovations by Tatsuo Matsudo: Pioneering Plasma Processing Technologies
Introduction: Tatsuo Matsudo is a notable inventor based in Nirasaki, Japan, with an impressive portfolio of 52 patents to his name. His work primarily focuses on plasma processing technologies, which are critical in numerous applications, particularly in the semiconductor industry.
Latest Patents: Among Matsudo's latest innovations are two significant patents: the Plasma Processing Apparatus and the Film Forming Apparatus. The Plasma Processing Apparatus comprises a chamber, a gas supply, an exhaust device, a substrate support with a lower electrode, an upper electrode, and a high-frequency power supply. It ensures precise control of the gas supply to maintain the chamber pressure above 26.66 Pa while utilizing a frequency lower than 13.56 MHz. Additionally, the impedance circuit plays a vital role in optimizing the electrical paths for improved efficiency. The Film Forming Apparatus enhances film forming processes by integrating a vacuum-processing chamber, voltage application units, and a gas supply unit, enabling effective plasma generation for various applications.
Career Highlights: Matsudo has had a distinguished career working with reputable companies. Notably, he has been associated with Tokyo Electron Limited and Texas Instruments Corporation, where he conducted groundbreaking research and development in the field of plasma processing technology. His contributions have been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations: Throughout his career, Matsudo has collaborated with esteemed colleagues such as Chishio Koshimizu and Jun Yamawaku. Their teamwork and expertise in various fields have contributed to the success of numerous projects and innovations, further establishing their reputation in the industry.
Conclusion: Tatsuo Matsudo exemplifies innovation in the realm of plasma processing technologies through his extensive patent portfolio and career achievements. His work in developing sophisticated plasma processing and film-forming apparatus is pivotal for industries reliant on cutting-edge semiconductor technology. As technology continues to evolve, Matsudo's contributions will undoubtedly play a significant role in shaping the future of this field.