The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Nov. 08, 2021
Tokyo Electron Limited, Tokyo, JP;
Tatsuo Matsudo, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus comprising: a chamber; a gas supply configured to supply gas into the chamber; a substrate support provided in the chamber; a ground electrode electrically grounded and provided in the chamber; an upper electrode provided above the substrate support and the ground electrode; a first high-frequency power supply electrically connected to the upper electrode to generate a plasma from the gas in the chamber; a second high-frequency power supply electrically connected to the upper electrode; and a rectifier configured to block application of a negative voltage to the upper electrode by the second high-frequency power supply.