The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2020
Filed:
Dec. 07, 2017
Tokyo Electron Limited, Tokyo, JP;
Ayuta Suzuki, Yamanashi, JP;
Kosuke Yamamoto, Yamanashi, JP;
Kazuyoshi Matsuzaki, Yamanashi, JP;
Munehito Kagaya, Yamanashi, JP;
Tsuyoshi Moriya, Yamanashi, JP;
Tadashi Mitsunari, Yamanashi, JP;
Atsushi Kubo, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A film forming apparatus includes a gas injection unit having a shower plate provided with gas injection holes, and a plurality of partition regions through which gases are separately injected and which are defined by dividing an arrangement region of the gas injection holes into a plurality of concentric regions in a diametrical direction of the substrate. A supply amount of a raw material gas per unit time in a raw material gas supply period in a cycle of forming a monomolecular layer by supplying the raw material gas and a reactant gas multiple times, and per unit area of the shower plate, and/or a supply amount of the reactant gas per unit time in a reaction period of the raw material gas and the reactant gas in the cycle, and per unit area of the shower plate becomes different in at least two of the partition regions.