Location History:
- Yamanashi, JP (2020)
- Nirasaki, JP (2018 - 2023)
Company Filing History:
Years Active: 2018-2023
Title: Innovations of Kosuke Yamamoto
Introduction
Kosuke Yamamoto is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of four patents. His work focuses on advanced learning devices and methods for producing semiconductor devices.
Latest Patents
Yamamoto's latest patents include a learning device, an inference device, and a learned model. The learning device is designed to perform machine learning based on a learning model using data input to an input layer. It features a calculation part that calculates a predetermined number of features, utilizing simulation data from semiconductor manufacturing processes. This data is associated with XY coordinates parallel to a wafer's plane. Additionally, he has developed a method for manufacturing semiconductor devices that includes forming a metal oxide film. This method involves supplying a precursor gas to create a precursor layer, followed by oxidizing the layer to form a metal oxide layer. The process also includes cycles of supplying an HO removal gas to ensure the quality of the metal oxide layer.
Career Highlights
Yamamoto's career is marked by his innovative approaches to semiconductor technology. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing and machine learning applications. His work has the potential to enhance the efficiency and effectiveness of semiconductor production processes.
Collaborations
Yamamoto collaborates with notable colleagues such as Kazuyoshi Matsuzaki and Ayuta Suzuki. Their combined expertise contributes to the advancement of technology in their field.
Conclusion
Kosuke Yamamoto's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of semiconductor manufacturing.