The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

May. 22, 2020
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Tsuyoshi Moriya, Tokyo, JP;

Tadahiro Ishizaka, Nirasaki, JP;

Yoshinori Morisada, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); C23C 16/27 (2006.01); C23C 16/455 (2006.01); G03F 1/00 (2012.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C23C 16/27 (2013.01); C23C 16/45536 (2013.01); G03F 1/00 (2013.01); H01L 21/31144 (2013.01);
Abstract

In a hard mask formed on a target film formed on a substrate, a first film having a stress in a first direction and a second film having a stress in a second direction opposite to the first direction are alternately stacked one or more times.


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