Miyagi, Japan

Masanobu Honda

This inventor holds 109 USPTO granted patents and 19 published patent applications and 5 EPO patents, primarily in Plasma Processing (CPC class H01L21-31144). Top assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba, Max Co., Ltd.. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masanobu Honda. Retrieved from https://idiyas.com/inventor/masanobu-honda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 109 

% Patents Active = 78.0

 

Average Co-Inventor Count = 2.9

ph-index = 12

Forward Citations = 533(Granted Patents)

Forward Citations (Not Self Cited) = 469(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Yamanashi-Ken, JP (2009 - 2014)
  • Yamanashi, JP (2008 - 2015)
  • Nirasaki, JP (2008 - 2019)
  • Miyagi, JP (2015 - 2024)

Company Filing History:


Years Active: 2008-2026

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Areas of Expertise:
Plasma Processing
Etching Method
Substrate Processing
Film Deposition
Patterning
Semiconductor Manufacturing
Workpiece Processing
Inference Device
Learning Device
Treatment Method
Apparatus
Systems
109 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Masanobu Honda in Etching Technology

Introduction

Masanobu Honda, residing in Miyagi, Japan, is a prolific inventor with an impressive portfolio of 97 patents. His work primarily focuses on advancements in etching technology, showcasing his ingenuity and dedication to the field of innovation.

Latest Patents

Among his recent inventions, the etching apparatus stands out. This apparatus selectively etches a first region in relation to a second region composed of a different material. It operates through a controlled procedure that includes generating plasma from a treatment gas mix, which contains fluorocarbon gas, an oxygen-containing gas, and an inert gas. The process forms a deposit of fluorocarbon on the workpiece, followed by the etching of the first region using radicals from the deposit. Additionally, Honda’s etching method involves applying a film made from the same material as the region to be etched, with a mask that has an opening for partial exposure. This method improves the efficiency and accuracy of substrate processing.

Career Highlights

Masanobu Honda has had a successful career, contributing his expertise to major companies such as Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His roles at these organizations have solidified his reputation as an authority in the field of etching and substrate processing technologies.

Collaborations

Throughout his career, Honda has collaborated with notable peers including Toru Hisamatsu and Yoshihide Kihara. Their collective efforts have fostered advancements in their area of specialization, enhancing the technological landscape of etching methodologies.

Conclusion

Masanobu Honda's significant contributions to the field of etching technology, as evident from his numerous patents, underline his impact as an innovator. With a career marked by collaboration and technological leadership, Honda continues to inspire future generations of inventors and engineers in Japan and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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