Alok Ranjan

Austin, TX, United States of America

Alok Ranjan

USPTO Granted Patents = 116 

Average Co-Inventor Count = 2.7

ph-index = 14

Forward Citations = 569(Granted Patents)

Forward Citations (Not Self Cited) = 546(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Slingerlands, NY (US) (2013 - 2015)
  • Mechanicville, NY (US) (2015 - 2020)
  • Tomiya, JP (2018 - 2021)
  • Austin, TX (US) (2018 - 2024)

Company Filing History:


Years Active: 2013-2025

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Areas of Expertise:
Plasma Processing
Capacitively Coupled Plasma
Etching Techniques
Euv Resist Patterning
Autonomous Plasma Tools
Selective Deposition
Cyclic Plasma Processing
Radio Frequency Plasma
Electron Beam Mediated Etching
Anisotropic Etching
Gas Cluster Assisted Processing
Virtual Metrology
116 patents (USPTO):Explore Patents

Sure, here is the article about inventor Alok Ranjan:

Title: Alok Ranjan: Pioneering Innovations in Technology

Introduction:

Alok Ranjan, a prolific inventor based in Austin, TX, is a visionary whose passion for innovation and unwavering quest for excellence have cemented his position as a trailblazer in the realm of technology. With a remarkable portfolio of 100 patents, Ranjan continues to inspire the next generation of inventors and entrepreneurs with his groundbreaking work.

Latest Patents:

Among his latest patents is the "Method for gate stack formation and etching," a revolutionary technique that enhances the fabrication of high aspect ratio features in substrates. By incorporating a thin bottom layer of silicon germanium, Ranjan's method ensures improved profile formation, particularly in fin field effect transistor (FinFET) gates. Additionally, his groundbreaking "Cyclic plasma processing" patent showcases his knack for developing innovative solutions for substrate processing, underscoring his technical prowess and ingenuity.

Career Highlights:

Alok Ranjan's illustrious career is highlighted by his tenure at Tokyo Electron Limited, where he has played a pivotal role in driving technological advancements and spearheading cutting-edge research and development initiatives. His innovative spirit and commitment to excellence have not only propelled the company's success but have also contributed significantly to the wider tech industry.

Collaborations:

Ranjan's collaborative efforts with esteemed colleagues such as Peter Ventzek and Sergey Alexandrovich Voronin have yielded groundbreaking innovations that have pushed the boundaries of technological possibilities. His ability to foster synergistic relationships and leverage collective expertise underscores his collaborative leadership style and commitment to driving impactful change.

Conclusion:

In conclusion, Alok Ranjan stands as a formidable figure in the world of technology, with a legacy defined by innovation, excellence, and a relentless pursuit of advancement. His groundbreaking patents and collaborative endeavors serve as a testament to his enduring impact on the industry, inspiring a new wave of inventors and entrepreneurs to dream big and push the boundaries of what is possible in the realm of technology.

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