The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
May. 03, 2022
Tokyo Electron Limited, Tokyo, JP;
Barton Lane, Austin, TX (US);
Alok Ranjan, Austin, TX (US);
Peter Lowell George Ventzek, Austin, TX (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
An apparatus for plasma processing includes a pedestal configured to support a substrate and a conductive structure disposed at the pedestal. The conductive structure is configured to generate a plasma localized at an edge region of the substrate. The conductive structure may be a resonant structure. The apparatus may include a focus ring that has an insulating material with an annular shape defining an interior opening. The conductive structure may be embedded within the insulating material and be configured to generate the plasma along the annular shape and surrounding the interior opening. Processing conditions at the edge region of the substrate may be controlled using the plasma localized at the edge region.