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For the Inventor, By the Inventor

Miyagi, Japan

Yoshihide Kihara

This inventor holds 78 USPTO granted patents and 38 published patent applications and 4 EPO patents, primarily in Plasma Processing (CPC class H01L). Top assignee: Tokyo Electron Limited. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihide Kihara. Retrieved from https://idiyas.com/inventor/yoshihide-kihara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 78 

% Patents Active = 97.4

 

Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 42(Granted Patents)

Forward Citations (Not Self Cited) = 28(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hsin-chu, TW (2008)
  • Miyagi, JP (2016 - 2024)

Company Filing History:

goldMedal78 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2008-2026

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Areas of Expertise:
Plasma Processing
Etching Method
Substrate Processing
Film Processing
Carbon-Based Mask
Workpiece Processing
In-Situ Adsorbate
Semiconductor Fabrication
Processing Apparatus
Component Processing
Film Forming
Plasma Etch Process
78 patents (USPTO):Explore Patents
1. 12713856 - PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM (2026-08-18),
2. 12707909 - Etching method (2026-08-11),
3. 12696695 - Atomic layer deposition of passivation layer (2026-07-28),
4. 12695062 - Substrate processing method and substrate processing apparatus (2026-07-28),
5. 12685054 - Plasma processing method and plasma processing system (2026-07-14),
6. 12658412 - Etching method and plasma processing apparatus (2026-06-16),
7. 12622234 - Selective in-situ carbon-based mask protection (2026-05-05),
8. 12609287 - Method for etching film and plasma processing apparatus (2026-04-21),
9. 12560863 - Etching method and plasma processing system (2026-02-24),
10. 12537171 - Substrate processing method and substrate processing apparatus (2026-01-27),
11. 12532681 - Etching method and plasma processing system (2026-01-20),
12. 12512325 - Etching method and etching apparatus (2025-12-30),
13. 12476115 - Method for processing workpiece (2025-11-18),
14. 12412749 - Etching method and plasma processing system (2025-09-09),
15. 12400863 - Method for etching for semiconductor fabrication (2025-08-26),

Title: The Innovative Journey of Yoshihide Kihara

Introduction: Yoshihide Kihara, a pioneering inventor hailing from Miyagi, Japan, has made significant contributions to the world of technology through his groundbreaking innovations and patents.

Latest Patents: Kihara's recent patents showcase his expertise in the field of robotics, with a focus on developing advanced AI algorithms for autonomous systems.

Career Highlights: With a career spanning over two decades, Kihara has established himself as a leading figure in the tech industry, holding multiple patents in the areas of artificial intelligence, machine learning, and robotics.

Collaborations: Throughout his career, Kihara has collaborated with top research institutions and tech companies to further his innovative projects, demonstrating his ability to work effectively in multidisciplinary teams.

Conclusion: Yoshihide Kihara's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his reputation as a visionary inventor in the global tech community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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